Cluster Multi Sputtering System

Model Number

CSS5000 Series

Features

CSS5000 is industrial equipment for MEMS Device. CSS5000 System is comprised of cluster type Chambers Load Lock, Unload Lock, Trans Module, 3 Process Module

Application

• Metal & Oxide Coating
• Multi layer coating
• MEMS Application

Specifications

• Sample Size : 4.75 ~ 12.5inch
• Process Chamber : 3set
• Vacuum pumping system : (Rotary + TMP, etch process chamber)
• Magnetron sputter source : 16inch Sputter Gun x 3ea
• Sample Rotation : Rotation only
• Sample Heating Source L Circular 12.5inch
• Thermocouple + Pyrometer(1set)
• Sample sub-sector : 4.75, 6, 6.5, 7, 8, 12.5inch x 3set
• Gas Supply System : Ar, O2 x 3set
• Power supply : DC, Pulsed DC or RF Power(Option)
• Film Uniformity : <±5% for WIW, WTW and RTR
• Full Automation Control System using PC Interface